Electrochromic layer

ABSTRACT

An improved electrochromic device comprising a substrate and a first conductive layer located on the transparent substrate. An ion storage layer is located on the first conductive layer. An electrolyte layer is located on the ion storage layer with an active layer being located on the electrolyte layer. A second conductive layer is located on the active layer.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims benefit of United States Patent Provisionalapplication Ser. No. 60/187,704 filed Mar. 7, 2000. All subject matterset forth in provisional application serial No. 60/187,704 is herebyincorporated by reference into the present application as if fully setforth herein.

BACKGROUND OF THE INVENTION

1. Field of the Invention

This invention relates to variable reflective and variable transmissionlayers and more particularly to an improved electrochromic device withsuperior variable reflective and variable transmission properties.

2. Background of the Related Art

Electrochromic devices operate in a manner similar to the operation of abattery. In a battery, electrons or ions are stored in layers ofmaterials commonly referred to as battery plates. The ions are availableto move to perform work when connected to an external electricalcircuit.

An electrochromic device has an electron/ion storage layer and anelectron/ion active layer. In the electrochromic device, the chargestate of the active layer affects the optical properties of theelectrochromic device. When an ionic species (+) is drawn into theactive layer by an applied voltage the active layer of theelectrochromic device becomes opaque. When the voltage is reversed, theionic species (+) moves away from the active layer to the storage layerand the active layer of the electrochromic device becomes clear.

An electrochromic device is made of several layers of materials witheach layer being capable of transmitting light in the visible spectrum.Since the electrochromic device must be capable of transmitting light inthe visible spectrum, each of the several layers is made appropriatelythin.

The active layer of the electrochromic device which stores the ions andchanges optical properties is usually a transition metal oxide such astungsten trioxide (WO₃) or nickel oxide (NiO). Tungsten based devicesdominate research since the optical properties are more suited for solarspectral abatement. The WO₃ film is dominated by dense highly columnarregions and an intermolecular void network. With a small negativevoltage applied to the top electrode closest to the WO₃ film, positivelycharged ions diffuse into these voids from the ion storage layer throughthe electrolyte. This changes the stoichiometry and opticalcharacteristics darkening the electrochromic film. The amount of lighttransmitted through the film can be adjusted by controlling the voltageapplied to the device or the length of time the voltage is applied tothe device. The film can then be discharged and made transparent byreversing the voltage.

The other critical layer to the electrochromic device is theion-conductor layer (analogous to the electrolyte in a battery). The ionconductor layer must be able to pass ions into the adjoiningelectrochromic layer yet suppress electron transport. Organic polymersas well as solid state electrolyte materials have been successfullydemonstrated as ion conductor layers. Organics are relativelyinexpensive, easy to apply, and flexible. Unfortunately, organicemulsions are the most sensitive to ultraviolet light and weatheringdegradation.

Solid state electrolytes such as tantalum pentoxide Ta₂O₅, magnesiumfluoride MgF, or lithium nitride Li₃N can be more difficult to apply butare more stable and offer better durability properties necessary forlarge scale applications such as windows or the like.

The final layer used in the electrochromic device is the ion storagelayer. The ion storage layer may be fabricated from materials such asvanadium pentoxide V₂O₂.

Electrodes for the electrochromic device may be either of a transmissiveelectrode or a reflective electrode. Although many types of transparentconductors are available, the most popular material for transmissiveelectrode is indium-tin-oxide (ITO). Although many types of reflectiveconductors are available, the most popular materials for reflectiveelectrode are silver and aluminum.

U.S. Pat. No. 4,110,015 to Reddy discloses an improved electrolyte foruse in electrochromic devices. These electrolytes are prepared by theincorporation of a lithium salt in a solvent selected fromdimethylsulfite, nitromethane, and sulfolane.

U.S. Pat. No. 4,253,742 to Morita discloses an electrochromic displaycell comprising a display electrode, a counter electrode spaced from andfacing the display electrode and an electrochromic layer deposited onthe display electrode, and a solid electrolyte layer conductive tolithium ion disposed between the electrodes. The solid electrolyte layeris formed from materials selected from the group consisting of Li₃N,Li₂+_(x)C_(1−x) B_(x)O₃, Li₄+_(x) Si_(1−x) P_(x)O₄ and Li₅+_(x)Ag_(1−x)Si_(x)O₄ where 0<x<1.

U.S. Pat. No. 4,491,392 to Elmer et al. discloses an electrochromicdevice comprising a solid electrolyte wherein the electrolyte consistsof porous glass impregnated with a solid ion-conductive compound such asan alkali metal salt.

U.S. Pat. No. 4,687,560 to Tracy et al. discloses a method ofsynthesizing electro-optically active reaction products from a pluralityof reactants by inducing a reaction by plasma deposition among thereactants. The plasma reaction is effective for consolidating thereactants and producing thin films of electro-optically activetransition metal oxides.

U.S. Pat. No. 5,260,821 to Chu et al. discloses an electrochromic systemwhich comprises layers of solid/materials deposited on glass or anothersubstrate. The solids function in an atmosphere that can be dry. Onelayer is preferably Li₃AlF₆ and conducts positive lithium ions. Anotherlayer is a counterelectrode. The counterelectrode is improved to theextent that it can reversibly accept ions from and donate them to theion conductor while remaining extensively transparent. Thecounterelectrode can be Li_(x)TiO_(y), (Li₂O)_(m)WO₃)_(n)(Sb₂O₃), or(Li₂O)_(m)(WO₃)_(n)—(CeO₂)_(o).

U.S. Pat. No. 5,404,244 to Van Dine et al discloses the invention whichprovides for the simplified production of chromogenic devices includingrelatively large scale devices in panel form. One or more of the layersof the invention are formed from heated, hydrolyzed gel reaction productof one or more dissolved organo-inorganics, such as alkoxides, which maybe metallic. The invention includes an ion-conducting layer whichcomprises a lithium based ceramic material containing residual organicimpurities.

U.S. Pat. No. 5,659,417 to Van Dine et al. discloses electrochromicdevices applied to a substrate including an electrochromic electrodelayera, a counterelectrode layer and an ion-conducting layer sandwichedbetween those two layers and electrically isolating them from eachother. The ion-conducting layer is substantially uniform across thesubstrate and comprises an inorganic superstructure with associatedorganic material and with a microstructure which facilitates thetransfer of ions. Methods for producing these devices are also disclosedincluding depositing the ion-conducting layer on the substrate in theform of a solution, and effecting gelation of that solution.

U.S. Pat. No. 5,663,829 to Lefrou et al. discloses an electrochromicsystem comprising a transparent electrically conducting film, a film ofa cathodic electrochromic material, which is capable of reversiblyinserting M⁺ cations of type H⁺ or Li⁺, an electrolyte film,counter-electrode film made of an anodic electrochromic material, and asecond electrically conducting film. The structure having a barrier filminterposed between the electrolyte and the counter-electrode. Thebarrier film is open to the diffusion of the M⁺ cations and isconstituted of the following materials selected from the groupconsisting of oxides of metals of Group VB of the Periodic Table,mixtures of these oxides, CeF₃, Sb₂ O₃, HUP (hexauranylphosphate),Cr₂O₃, ZrO₂, and an ion conductor material of Li₃N, LiTaO₃, LiAlF₄,Li₃PO₄, LiBO₂ or LiNbO₃.

U.S. Pat. No. 5,666,771 to Macquart et al. discloses an invention whichconcerns an electrochromic pane comprising a principal functional filmconstituted of a material which under the effect of an electric currentis capable of reversibly inserting cations and which has characteristicsof coloration and/or transmission in certain wavelengths ofelectromagnetic radiation that differ for its inserted and deinsertedstates. The principal functional film has a quasi-columnar structure,with axes of growth of the columns parallel to straight lines containedwithin a dihedron, the opening of which is less than 20 degrees and thebisector plane of which makes an acute angle with the substrate.

U.S. Pat. No. 5,757,537 to Ellis, Jr. et al. discloses an electrochromicdevice which may be used for large surface area applications. Thedevices utilize optical tuning to minimize optical interference betweenlayers of the structure and to maximize uniform optical transparency.Optical tuning also enables transparent conductive oxide layers to bereplaced by thin conductive metal layers, thereby reducing the overallthickness of these devices and facilitating the manufacturing process.

U.S. Pat. No. 5,780,160 to Allemand et al. discloses electrochromicdevices and processes for preparing the same which are provided which donot require a separate process step of ion intercalation by employing anelectrochromically-inert reducing or oxidizing additive in theelectrochemically active material or the electrolyte of theelectrochromic devices.

Although the aforementioned patents have made advancement to theelectrochromic art, the aforementioned patents have not providedelectrochromic devices suitable for large scale in a wide variety ofuses and applications.

Therefore, an object of this invention is to provide an improvedelectrochromic device with superior properties than heretofore known inthe art.

Another object of this invention is to provide an improvedelectrochromic device having a rapid response heretofore unknown in theelectrochromic art.

Another object of this invention is to provide an improvedelectrochromic device which may be manufactured on a commercial basis ata reasonable cost.

Another object of this invention is to provide an improvedelectrochromic device which is reliable and durable enabling theimproved electrochromic device to be used in hostile environments.

The foregoing has outlined some of the more pertinent objects of thepresent invention. These objects should be construed as being merelyillustrative of some of the more prominent features and applications ofthe invention. Many other beneficial results can be obtained by applyingthe disclosed invention in a different manner or modifying the inventionwith in the scope of the invention. Accordingly other objects in a fullunderstanding of the invention may be had by referring to the summary ofthe invention and the detailed description describing the preferredembodiment of the invention.

SUMMARY OF THE INVENTION

A specific embodiment of the present invention is shown in the attacheddrawings. For the purpose of summarizing the invention, the inventionrelates to an improved method and an improved electrochromic devicecomprising a substrate and a first conductive layer located on thetransparent substrate. An ion storage layer is located on the firstconductive layer. An electrolyte layer is located on the ion storagelayer with an active layer being located on the electrolyte layer. Asecond conductive layer is located on the active layer.

In a more specific embodiment of the invention, the improvedelectrochromic device includes conductive bus bars located on the firstconductive layer and located on the transparent substrate. A hermeticlayer is bonded to the transparent substrate for sealing theelectrochromic device of the present invention.

In one embodiment of the invention, the substrate is substantiallytransparent. In a more specific example of the invention, the firstconductive layer located on the transparent substrate isindium-tin-oxide (ITO).

In another embodiment of the invention, the ion storage layer located onthe first conductive layer is vanadium pentoxide (V₂ 0 ₅). Theelectrolyte layer located on the ion storage layer is an inorganic solidstate electrolyte comprised of lithium phosphate (Li₃PO₄).

In one embodiment of the invention, the active layer located on theelectrolyte layer is a transition metal oxide. In another example of theinvention, the active layer located on the electrolyte layer is selectedfrom the group consisting of tungsten trioxide (WO₃) and nickel oxide(NiO). Preferably, the active layer located on the electrolyte layer istungsten trioxide (WO₃).

In still a further embodiment of the invention, the second conductivelayer located on the active layer is transparent. In another example ofthe invention, the second conductive layer located on the active layeris transparent indium-tin-oxide (ITO). In another example of theinvention, the second conductive layer located on the active layer isreflective. In another example of the invention, the second conductivelayer located on the active layer is reflective aluminum (Al).

The invention is also incorporated into the method of forming theimproved electrochromic device wherein at least one of the layers isdeposited by vacuum deposition. In another example of the invention, atleast one of the layers is deposited by plasma enhanced chemical vapordeposition (PECVD).

The foregoing has outlined rather broadly the more pertinent andimportant features of the present invention in order that the detaileddescription that follows may be better understood so that the presentcontribution to the art can be more fully appreciated. Additionalfeatures of the invention will be described hereinafter which form thesubject matter of the invention. It should be appreciated by thoseskilled in the art that the conception and the specific embodimentsdisclosed may be readily utilized as a basis for modifying or designingother structures for carrying out the same purposes of the presentinvention. It should also be realized by those skilled in the art thatsuch equivalent constructions do not depart from the spirit and scope ofthe invention.

BRIEF DESCRIPTION OF THE DRAWINGS

For a fuller understanding of the nature and objects of the invention,reference should be made to the following detailed description taken inconnection with the accompanying drawings in which:

FIG. 1 is an isometric view of a transparent substrate of theelectrochromic device of the present invention;

FIG. 2 is a side sectional view of FIG. 1;

FIG. 3 is an isometric view similar to FIG. 1 illustrating thedeposition of a first conductive layer located on the transparentsubstrate;

FIG. 4 is a sectional view along line 4—4 of FIG. 3;

FIG. 5 is an isometric view similar to FIG. 3 illustrating thedeposition of conductive bus bars located on the first conductive layerand located on the transparent substrate;

FIG. 6 is a sectional view along line 6—6 of FIG. 5;

FIG. 7 is an isometric view similar to FIG. 5 illustrating thedeposition of an ion storage layer located on the first conductivelayer;

FIG. 8 is a sectional view along line 8—8 of FIG. 7;

FIG. 9 is an isometric view similar to FIG. 7 illustrating thedeposition of an electrolyte layer located on the ion storage layer;

FIG. 10 is a sectional view along line 10—10 of FIG. 9;

FIG. 11 is an isometric view similar to FIG. 9 illustrating thedeposition of an active layer located on the electrolyte layer;

FIG. 12 is a sectional view along line 12—12 of FIG. 11;

FIG. 13 is an isometric view similar to FIG. 9 illustrating thedeposition of a second conductive layer located on the active layer;

FIG. 14 is a sectional view along line 14—14 of FIG. 13;

FIG. 15 is an isometric view similar to FIG. 9 illustrating thedeposition of a hermetic layer for bonding with the transparentsubstrate for sealing the electrochromic device of the presentinvention;

FIG. 16 is a sectional view along line 16—16 of FIG. 15;

FIG. 17 is an enlarged sectional view of a portion of the electrochromicdevice of the present invention illustrating the ions in the electrolytelayer;

FIG. 18 is a view similar to FIG. 17 illustrating the migration of theions into the active layer upon application of a voltage between thefirst and second electrodes;

FIG. 19 is a view similar to FIG. 18 illustrating the complete migrationof the ions into the active layer thereby processing a darkening of theactive layer;

FIG. 20 is a view similar to FIG. 19 illustrating the migration of theions from the active layer upon application of a reverse voltage betweenthe first and second electrodes;

FIG. 21 is a view similar to FIG. 20 illustrating the migration of theions from the active layer into the electrolyte layer; and

FIG. 22 is a view similar to FIG. 21 illustrating the migration of theions from the electrolyte layer into the storage layer.

Similar reference characters refer to similar parts throughout theseveral Figures of the drawings.

DETAILED DISCUSSION

FIGS. 1-16 are various views illustrating the method of forming anelectrochromic device 10 of the present invention. The method of formingthe improved electrochromic device 10 includes at least one of thelayers being deposited by vacuum deposition or by plasma enhancedchemical vapor deposition (PECVD).

FIGS. 1 and 2 illustrate a substrate 20 of the electrochromic device 10.The substrate is defined by a top surface 20A and peripheral edges21-24. Preferably, the substrate 20 is substantially transparent. In amore specific example of the invention, the substrate 20 may be a rigidmaterial such as glass or may be a flexible material such as a polymericmaterial.

FIGS. 3 and 4 illustrate the deposition of a first conductive layer 30located on the transparent substrate 20. The first conductive layer 30covers the top surface 20A of the substrate 20 except for a narrow striparound the peripheral edges 21-24 of the substrate 20 and a rectangulararea 25. Preferably, the first conductive layer 30 located on thetransparent substrate is indium-tin-oxide (ITO). In one example, thefirst conductive layer 30 is deposited to have a thickness of 2000 to3000 angstroms.

The first conductive layer 30 includes a notch 35 having a taper 37. Thetaper 37 extends from the top of the first conductive layer 30 to thesubstrate 20. The taper 37 extends along the top surface 20A of. thesubstrate 20 an approximate length of 0.5 mm to 5.0 mm. As will bedescribed in greater detail hereinafter, the taper 37 provides a smoothtransition for the addition of subsequently applied layers whoseelectrical and mechanical properties can be adversely affected by anabrupt transition.

FIGS. 5 and 6 illustrate the deposition of conductive bus bars 40located on the first conductive layer 30 and located on the transparentsubstrate 20. The conductive bus bars 40 include a first and a secondU-shape conductive bus bar 41 and 42 located on the first conductivelayer 30. The conductive bus bars 40 include a conductive bus bar 43located on the transparent substrate 20. The conductive bus bar 43 iselectrically insulated from the first and second U-shape conductive busbars 41 and 42. The conductive bus bar 43 defines a first portion 43Aand a second portion 43B.

The first and second U-shape conductive bus bars 41 and 42 are initiallyseparated to enable the conductivity of the first conductive layer 30 tobe tested prior to the addition of subsequently applied layers. Afterthe conductivity of the first conductive layer 30 has been tested, thefirst and second U-shape conductive bus bars 41 and 42 may be shorted bya connector (not shown) to provide for an external electrical connectionto the electrochromic device 10.

Preferably, the conductive bus bars 40 are made from a suitable metallicmaterial such as nickel or the like for enabling an external connectionto be made to the electrochromic device 10. In one example, theconductive bus bars 40 were formed from nickel (Ni) and deposited tohave a thickness of 1000 to 3000 angstroms for enabling externalconnection to be soldered to the electrochromic device 10.

FIGS. 7 and 8 illustrate the deposition of an ion storage layer 50located on the first conductive layer 30. The ion storage layer 50extends across the tapered edge 35 of the first conductive layer 30. Inthis example of the invention, the ion storage layer 50 located on thefirst conductive layer 30 is vanadium pentoxide (V₂O₅). In one example,the ion storage layer 50 is deposited to have a thickness of 400 to 3000angstroms.

FIGS. 9 and 10 illustrate the deposition of an electrolyte layer 60located on the ion storage layer 50. The electrolyte layer 60 located onthe ion storage layer 50 is a solid state electrolyte. The electrolytelayer 60 is located on the ion storage layer 50 and extending across thetapered edge 37 of the first conductive layer 30 to the rectangular area25 of the substrate 20. As previously stated, the rectangular area 25 ofthe substrate 20 is not covered with the first conductive layer 30. Theelectrolyte layer 60 completely covers the entire perimeter of the ionstorage layer 50.

In a more specific example of the invention, the electrolyte layer 60located on the ion storage layer 50 is selected from the groupconsisting of tantalum pentoxide (Ta₂O₅), magnesium fluoride (MgF),lithium nitride (LiN₃) and lithium phosphate (Li₃PO₄). In this exampleof the invention, the electrolyte layer 60 is amorphous lithiumphosphate (Li₃PO₄).

Preferably, the electrolyte layer 60 is deposited to a thickness of lessthan 1000 angstroms. In one example, the electrolyte layer 60 isdeposited to have a thickness of 400 angstroms. A thin electrolyte layer60 is an important aspect of the present invention.

A thin electrolyte layer 60 reduces the transit time of the ions acrossthe electrolyte layer 60. The transit time of the ions across theelectrolyte layer 60 is inversely proportional to the thickness of theelectrolyte layer 60. The transit time of the ions is also related tothe voltage potential across the electrolyte layer 60. A thinelectrolyte layer 60 enables a rapid transit time of the ions across theelectrolyte layer 60 at a lower voltage potential across the electrolytelayer 60. Preferably, the electrolyte layer 60 is sufficiently thin toenable the ions to rapidly transit across the electrolyte layer 60 whenthe electrochromic device 10 is operated at less than one volt. When theelectrochromic device 10 is operated at less than one volt, theelectrochromic device 10 may be powered by a single photovoltaic cell ora single photoelectric-chemical cell.

Another advantage for operating the electrochromic device 10 at a lowvoltage is to prevent unwanted electrochemical reactions with water andhydroxyl radicals. The threshold for the hydrolyzation of water is about1.3 Volts. In the presence of ultra-violet light, aphoto-electrochemical reaction can take place at even lower voltages.The thin ion conductor layer allows the electrochromic device 10 tooperate successfully at voltages as low as 0.7 Volts which is well belowthe threshold of the unwanted reactions.

FIGS. 11 and 12 illustrate the deposition of an active layer 70 locatedon the electrolyte layer 60. Preferably, the active layer 70 is the samesize and same registry as the ion storage layer 50. In one embodiment ofthe invention, the active layer 70 located on the electrolyte layer 60is a transition metal oxide. In another example of the invention, theactive layer 70 located on the electrolyte layer 60 is selected from thegroup consisting of tungsten trioxide (WO₃) and nickel oxide (NiO).Preferably, the active layer 70 located on the electrolyte layer 60 isamorphous or polycrystalline tungsten trioxide (WO₃).

FIGS. 13 and 14 illustrate the deposition of a second conductive layer80 located on the active layer 70. The second conductive layer 80 is anelectrically conductive material located on the top of the active layer70 and extending across and overlaying the tapered edge 37 onto thefirst portion 43A of the conductive bus bar 43. In this example, thesecond conductive layer 80 does not cover the second portion 43B of theconductive bus bar 43. The second portion 43B of the conductive bus bar43 is used for enabling an external connection to be soldered to thesecond conductive layer 80. The electrolyte layer 60 insulates thesecond conductive layer 80 from the first conductive layer 30. In afirst embodiment of the invention, the second conductive layer 80 istransparent. The second electrically conductive layer 80 may be selectedfor the group comprising indium-tin-oxide (ITO), fluorine doped tinoxide, or a grid of metallic material or electrically conductivematerial.

In an alternate example of the invention, the second conductive layer 80located on the active layer 70 is reflective. In another example of theinvention, the second conductive layer 80 located on the active layer 70is reflective aluminum (Al). The first and second conductive layers 30and 80 function as first and second electrodes 30 and 80.

FIGS. 15 and 16 illustrate the deposition of a hermetic layer 90 forbonding with the transparent substrate 20 for sealing the electrochromicdevice 10 of the present invention. In one example, the hermetic layer90 comprises a protective layer comprised of SiO₂ which covers theentire electrochromic stack of layers 30, 50, 60, 70 and 80 and bonds tothe peripheral edges 21-24 of the substrate 20 to provide a hermeticencapsulation for the electrochromic device 10.

FIG. 17 is an enlarged sectional view of a portion of the electrochromicdevice 10 of the present invention illustrating the ions in theelectrolyte layer 60. Neither the active layer 70 nor the ion storagelayer 50 is intercalated with ions. In this condition the ion storagelayer 50 exhibits a very pale transparent yellow color and the activelayer 70 is completely transparent.

FIG. 18 is a view similar to FIG. 17 illustrating the migration of theions into the active layer 70 upon application of a voltage between thefirst and second conductive layers or electrodes 30 and 80. The electricfield that exists between the first transparent electrically conductivelayer 30 and the reflective metal layer 80 repels the ions away from theion storage layer 50 toward the active layer 70. This causes the activelayer 70 to darken as the active layer 70 becomes intercalated with theions reducing transmission of light reflected from the reflective metalelectrode 80.

FIG. 19 is a view similar to FIG. 18 illustrating the equilibriumcondition when the migration of the ions into the active layer 70 iscomplete thereby rendering the active layer 70 into a darkest state. Theelectric current through the electrochromic device 10 ceases to flowbecause the ions are no longer moving and the only current flowingresults from flaws in the electrolyte layer 60.

FIG. 20 is a view similar to FIG. 19 illustrating the migration of theions from the active layer 70 upon application of a reverse voltagebetween the first and second electrodes 30 and 80.

The coloration process is reversed as the active layer 70 isde-intercalated and the ions move back into the electrolyte layer 60.

FIG. 21 is a view similar to FIG. 20 illustrating the migration of theions from the active layer 70 into the electrolyte layer 60. Themajority of the ions are in the electrolyte layer 60 and theelectrochromic device 10 exhibits the same optical properties as shownin FIG. 17.

FIG. 22 is a view similar to FIG. 21 illustrating the equilibriumcondition when the migration of the ions into the ion storage layer 50is complete thereby rendering the active layer 70 in the clearest andmost transparent state. The electric current through the electrochromicdevice 10 again ceases to flow because the ions are no longer moving andthe only current flowing results from flaws in the electrolyte layer 60in a manner similar to FIG. 19. The active layer 70 is completelytransparent and the ion storage layer 50 is clear.

The electrochromic device 10 provides a variable reflective or avariable transmission layer with superior variable reflective andvariable transmission properties.

The present disclosure includes that contained in the appended claims aswell as that of the foregoing description. Although this invention hasbeen described in its preferred form with a certain degree ofparticularity, it is understood that the present disclosure of thepreferred form has been made only by way of example and that numerouschanges in the details of construction and the combination andarrangement of parts may be resorted to without departing from thespirit and scope of the invention.

What is claimed is:
 1. An improved electrochromic device, comprising: asubstrate; a first conductive layer located on said substrate; an ionstorage layer located on the first conductive layer; an electrolytelayer located on the ion storage layer; said electrolyte layer having athickness less than 1000 angstroms; an active layer located on theelectrolyte layer; and a second conductive layer located on the activelayer.
 2. An improved electrochromic device, comprising: a substrate; afirst conductive layer located on said substrate; a first and a secondconductive bus bars located on said first conductive layer; said firstand second conductive bus bars being separated for testing theconductivity of said first conductive layer; an ion storage layerlocated on the first conductive layer; an electrolyte layer located onthe ion storage layer; an active layer located on the electrolyte layer;and a second conductive layer located on the active layer.
 3. Animproved electrochromic device, comprising: a substrate; a firstconductive bus bar located on said substrate; a first conductive layerlocated on said substrate; a second conductive bus bar located on saidfirst conductive layer; an ion storage layer located on the firstconductive layer; an electrolyte layer located on the ion storage layer;an active layer located on the electrolyte layer; a second conductivelayer located on the active layer; and a hermetic layer overlaying saidlayers and said conductive bus bars for bonding with the transparentsubstrate for sealing the electrochromic device.
 4. An improvedelectrochromic device as set forth in claim 1, wherein said substrate issubstantially transparent.
 5. An improved electrochromic device as setforth in claim 1, wherein said first conductive layer located on saidsubstrate is indium-tin-oxide (ITO).
 6. An improved electrochromicdevice as set forth in claim 1, wherein said ion storage layer locatedon the first conductive layer is vanadium pentoxide (V₂O₅).
 7. Animproved electrochromic device as set forth in claim 1, wherein saidelectrolyte layer located on the ion storage layer is a solid stateelectrolyte.
 8. An improved electrochromic device as set forth in claim1, wherein said electrolyte layer located on the ion storage layer isselected from the group consisting of tantalum pentoxide (Ta₂O₅),magnesium fluoride (MgF), lithium nitride (LiN₃) and lithium phosphate(Li₃PO₄).
 9. An improved electrochromic device as set forth in claim 1,wherein said electrolyte layer located on the ion storage layer islithium phosphate (Li₃PO₄).
 10. An improved electrochromic device as setforth in claim 1, wherein said active layer located on the electrolytelayer is a transition metal oxide.
 11. An improved electrochromic deviceas set forth in claim 1, wherein said active layer located on theelectrolyte layer is selected from the group consisting of tungstentrioxide (WO₃) and nickel oxide (NiO).
 12. An improved electrochromicdevice as set forth in claim 1, wherein said active layer located on theelectrolyte layer is tungsten trioxide (WO₃).
 13. An improvedelectrochromic device as set forth in claim 1, wherein said secondconductive layer located on the active layer is transparent.
 14. Animproved electrochromic device as set forth in claim 1, wherein saidsecond conductive layer located on the active layer is transparentindium-tin-oxide (ITO).
 15. An improved electrochromic device a setforth in claim 1, wherein said second conductive layer located on theactive layer is reflective.
 16. An improved electrochromic device as setforth in claim 1, wherein said second conductive layer located on theactive layer is reflective aluminum (Al).
 17. An improved electrochromicdevice as set forth in claim 1, wherein at least one of said layers isdisposed by vacuum deposition.
 18. An improved electrochromic device asset forth in claim 1, wherein at least one of said layers is disposed byplasma enhanced chemical vapor deposition (PECVD).
 19. An improvedelectrochromic device as set forth in claim 1, wherein said electrolytelayer totally overlays said first conductive layer and said ion storagelayer.
 20. An improved electrochromic device, comprising: a substrate; afirst conductive layer located on said substrate; a taper defined insaid first conductive layer; an ion storage layer located on the firstconductive layer; an electrolyte layer located on the ion storage layer;an active layer located on the electrolyte layer; and a secondconductive layer located on the active layer.
 21. An improvedtransmissive electrochromic device, comprising a monolithic stack ofsolid state inorganic materials deposited directly onto a transparent ortranslucent substrate comprised of glass, polymer, or fiberglassreinforced polymer, comprising: a first electrically conductive layer,which is substantially transparent, comprised of ITO, fluorine doped tinoxide, or a grid of metallic or electrically conductive material,located on the top surface of said transparent or translucent substrate;an ion storage layer, comprised of vanadium pentoxide (V₂O₅), located onthe top surface of the first electrically conductive layer; anelectrolyte layer, comprised of amorphous Li₃PO₄, located on the topsurface of the ion storage layer; said electrolyte layer having athickness less than 1000 angstroms; an active layer located on theelectrolyte layer, comprised of amorphous or polycrystalline WO₃,located on the top surface of the electrolyte layer; a secondelectrically conductive layer, which is substantially transparent,comprised of ITO, fluorine doped tin oxide, or a grid of metallic orelectrically conductive material, located on the top surface of theactive layer, an electrical contact for the first electricallyconductive layer comprised of a Ni pad, suitable for establishing anelectrical connection, located on the top surface of the firstelectrically conductive layer in an area not covered by the ion storagelayer, the ion conductor layer, the active layer, or the secondelectrically conductive layer; and an electrical contact for the secondelectrically conductive layer comprised of a Ni pad, suitable forestablishing an electrical connection, located on the top surface of thesubstrate in an area not covered by any layers except the secondelectrically conductive layer.
 22. An improved electrochromic device asset forth in claim 21, wherein said substrate is a substantially rigidsubstrate.
 23. An improved electrochromic device as set forth in claim21, wherein said substrate is a substantially flexible substrate.
 24. Animproved electrochromic device as set forth in claim 21, includingconductive bus bars located on the first conductive layer and located onthe transparent substrate.
 25. An improved electrochromic device as setforth in claim 21, wherein at least one of said layers is disposed byvacuum deposition.
 26. An improved electrochromic device as set forth inclaim 21, wherein at least one of said layers is disposed by plasmaenhanced chemical vapor deposition (PECVD).
 27. An improvedelectrochromic device as set forth in claim 21, including a protectivelayer comprised of SiO₂ which covers the entire electrochromic stack andbonds to the periphery of the substrate providing a hermeticencapsulation for the electrochromic device.
 28. An improvedtransmissive electrochromic device, comprising a monolithic stack ofsolid state inorganic materials deposited directly onto a transparent ortranslucent substrate comprised of glass, polymer, or fiberglassreinforced polymer, comprising: a first electrically conductive layer,which is substantially transparent, comprised of ITO located on the topsurface of said transparent or translucent substrate with the followingproperties; said layer covers the top surface of the substrate exceptfor a narrow strip around the periphery at the edges of the substrateand a larger rectangular area along one edge with the longer dimensionof the rectangle being aligned with the edge of the substrate; the edgeof the ITO bordering the uncovered rectangular area is smoothly taperedfrom the top of the ITO layer to the top surface of the underlyingsubstrate to provide a smooth transition for the subsequently appliedlayers whose electrical and mechanical properties can be adverselyaffected by an abrupt transition; an ion storage layer, comprised ofvanadium pentoxide (V₂O₅), located on the top surface of the firstelectrically conductive layer and extending across the tapered edge ofthe ITO to the uncoated area of the substrate; an electrolyte layer,comprised of amorphous Li₃PO₄, located on the top surface of the ionstorage layer and extending across the tapered edge of the ITO beyondthe edge of the Li₃PO₄ to the uncoated area of the substrate; an activelayer located on the electrolyte layer, comprised of amorphous orpolycrystalline WO₃, located on the top surface of the electrolytelayer; a nickel contact for the second electrically conductive layerlocated on the top surface of the substrate in the uncoated rectangulararea; a second electrically conductive layer, which is substantiallytransparent, comprised of ITO, fluorine doped tin oxide, or a grid ofmetallic or electrically conductive material, located on the top surfaceof the active layer and extending across the tapered edge of the ITOonto the top of a portion of the nickel contact; an electrical contactfor the first electrically conductive layer comprised of a Ni pad,suitable for establishing an electrical connection, located on the topsurface of the second electrically conductive layer; and a protectivelayer comprised of SiO₂ which covers the entire electrochromic stack andbonds to the periphery of the substrate providing a hermeticencapsulation for the electrochromic device.
 29. An improvedelectrochromic device as set forth in claim 28, wherein said substrateis a substantially rigid substrate.
 30. An improved electrochromicdevice as set forth in claim 28, wherein said substrate is asubstantially flexible substrate.
 31. An improved reflectiveelectrochromic device, comprising a monolithic stack of solid stateinorganic materials deposited directly onto a transparent or translucentsubstrate comprised of glass, polymer, or fiberglass reinforced polymer;comprising: a first electrically conductive layer, which issubstantially transparent, comprised of ITO, fluorine doped tin oxide,or a grid of metallic or electrically conductive material, located onthe top surface of said transparent or translucent substrate; an ionstorage layer, comprised of vanadium pentoxide (V₂O₅), located on thetop surface of the first electrically conductive layer; an electrolytelayer, comprised of amorphous Li₃PO₄, located on the top surface of theion storage layer; said electrolyte layer having a thickness less than1000 angstroms; an active layer located on the electrolyte layer,comprised of amorphous or polycrystalline WO₃, located on the topsurface of the electrolyte layer; and a second electrically conductivelayer, which is optically reflective, comprised of aluminum, silver, orany optically reflective and electrically conductive material, locatedon the top surface of the active layer; an electrical contact for thefirst electrically conductive layer comprised of a Ni pad, suitable forestablishing an electrical connection, located on the top surface of thefirst electrically conductive layer in an area not covered by the ionstorage layer, the ion conductor layer, the active layer, or the secondelectrically conductive layer; and an electrical contact for the secondelectrically conductive layer comprised of a Ni pad, suitable forestablishing an electrical connection, located on the top surface of thesubstrate in an area not covered by any layers except the secondelectrically conductive layer.
 32. An improved reflective electrochromicdevice, comprising a monolithic stack of solid state inorganic materialsdeposited directly onto a flexible transparent or translucent substratecomprised of glass, polymer, or fiberglass reinforced polymer,comprising: a first electrically conductive layer, which issubstantially transparent, comprised of ITO located on the top surfaceof said transparent or translucent substrate with the followingproperties; said layer covers the top surface of the substrate exceptfor a narrow strip around the periphery at the edges of the substrateand a larger rectangular area along one edge with the longer dimensionof the rectangle being aligned with the edge of the substrate; the edgeof the ITO bordering the uncovered rectangular area is smoothly taperedfrom the top of the ITO layer to the top surface of the underlyingsubstrate to provide a smooth transition for the subsequently appliedlayers whose electrical and mechanical properties can be adverselyaffected by an abrupt transition; an ion storage layer, comprised ofvanadium pentoxide (V₂O₅), located on the top surface of the firstelectrically conductive layer and extending across the tapered edge ofthe ITO to the uncoated area of the substrate; an electrolyte layer,comprised of amorphous Li3PO4, located on the top surface of the ionstorage layer and extending across the tapered edge of the ITO beyondthe edge of the Li₃PO₄ to the uncoated area of the substrate; an activelayer located on the electrolyte layer, comprised of amorphous orpolycrystalline WO₃, located on the top surface of the electrolytelayer; a nickel contact for the second electrically conductive layerlocated on the top surface of the substrate in the uncoated rectangulararea; a second electrically conductive layer, which is opticallyreflective, comprised of silver, aluminum, or other electricallyconductive and optically reflective material, located on the top surfaceof the active layer and extending across the tapered edge of the ITOonto the top of a portion of the nickel contact; an electrical contactfor the first electrically conductive layer comprised of a Ni pad,suitable for establishing an electrical connection, located on the topsurface of the second electrically conductive layer; and a protectivelayer comprised of SiO₂ which covers the entire electrochromic stack andbonds to the periphery of the substrate providing a hermeticencapsulation for the electrochromic device.
 33. An improvedelectrochromic device as set forth in claim 32, wherein said substrateis a substantially rigid substrate.
 34. An improved electrochromicdevice as set forth in claim 32, wherein said substrate is asubstantially flexible substrate.